Temperature Control and Modeling of Rapid Thermal Processing
نویسندگان
چکیده
منابع مشابه
Photon effect on radiative properties of silicon during rapid thermal processing
Emissivity is a critical parameter in the rapid thermal processing ~RTP! of semiconductors for temperature control and thermal modeling. It is often considered as a material property that depends on the sample temperature and surface finishing. For a silicon wafer placed in a radiation environment such as a RTP chamber, however, the ambient photons emitted from lamps create electron-hole pairs ...
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